New Facing Targets Sputtering System
Overview | Features | Principle | Applications | Product Information
The Principles and Properties of Conventional Facing Targets Sputtering (CFTS) and New Facing Targets Sputtering (NFTS)
CFTS Structure | CFTS/CMS Differences | CFTS Issues | NFTS Improvements | NFTS Plasma Source
NFTS Box-shaped Plasma Source
Box-shaped plasma source (small type)
NFTS plasma sources consist of a box shaped structure to avoid the equipment complexity with CFTS. These box type plasma sources can be easily attached to and removed from a side board of the vacuum chamber at an atmosphere. NFTS equipments are characterized by the separation of the plasma sources from the sidewall of vacuum chamber. Therefore, box shaped plasma sources can supply sputtering species to the surface of substrate being positioned inside of a sidewall of vacuum chamber with mechanics of carrying substrates. Furthermore, cooling water and electric power are supplied to the plasma source from the outside of the vacuum chamber. As a result, a compact and simple vacuum chamber and easy to handle NFTS plasma source are realized. The NFTS technology can very cost effectively produce thin films for wide width plastic film web. We have developed a roll to roll web coater type NFTS equipment to ascertain a superior performance of damage less thin film production using plastic films with low heat resistance.