NewSUBARU Synchrotron
Overview | LIGA BL02 | BL05 | BL07 | BL09 and BL10
NewSUBARU LIGA Beamline02
Optics
Schematic diagram of Lithography System
The main feature of this beamline is a structure of two beam ducts mounted together to allow either high energy or low energy beams to pass through. These two beam ducts are switched by the first mirror in the beam line.When the high energy synchrotron radiation is needed, the first mirror is excluded from the beam allowing the X-ray beam from the Synchrotron to be introduced straight into the high energy beam duct, and the beam is led to the end station X-ray lithography system. On the other hand, when the low energy synchrotron radiation is needed, the high energy component is cut by two mirrors. The beam is bent downward by a first plane mirror, and is then focused by the second cylindrical mirror. The beam is led to the end station through the low energy beam duct. The spectrum of the low energy synchrotron radiation can be controlled by the variable incidence angles of the two mirrors to that required for the fabrication purpose.
Optics for the high and low energy beams