X-ray Lithography System - Indus-100D
Overview | Features | Design | Control system | Scanning stage | Photos | Alignment
Features
X-ray scanner chamber
- Wide exposure area up to a substrate of 100mm in square or diameter
- 4-way Water-cooled Aperture to adjust exposure shape and size
- Silent and stable scanning with α-STEP™ motor
Range ±90mm, Speed up to 30mm/s
Uniformity of Speed ≤1% - Tilt and rotation stages for fabricating complex structure
Tilt -2°to 90°(parallel to X-ray beam)
Rotation ±180° - Water-cooled back plate to hold a mask & substrate assembly
- CCD camera to monitor the internal mechanisms
- Easy access door at the rear of vacuum chamber
Scanning stage
- Precise aligner with 1µm resolution
- Large & clean vacuum chamber
Dimension 1000mm(w) × 850mm(l) × 1000mm(h)
Grade UHV compatible - Wide operating pressure range from atmosphere to 10-2 mbar (Ultimate vacuum pressure depends on the applied pumping system)
- Helium gas flow controller
- Wide range beam height adjustment ±25mm
- Graphical users interface software coded by LabVIEW