X-ray Lithography System - Indus-100D
Overview | Features | Design | Control system | Scanning stage | Photos | Alignment
X-ray Scanning Stage
The scanning stage holds the mask and substrate chuck assemblies and the tilt and rotation module.
| Movement | Vertical (y-axis) direction |
| Exposure travel range | ±90mm (total 180mm) |
| Scan speed | 1 to 30mm/s |
| Uniformity of speed | ≤1% |
| Speed mode | Constant for the scan spped range |
| Scan acceleration | Max 600mm/s2 |
| Resting time at rerurn points | 0.1s |
| Axial run out | ≤±0.1mrad at any point on max travel range |
| Monitoring device | Optical CCD camera to monitor vertical scanning |
Mask and Substrate Chuck Assemblies
The substrate chuck assembly is part of the scanning stage. It allows easy mounting of the mask and substrate and holds the mask and substrate perpendicular to the beam during the exposure.
| Mask cross section | Circular - diameter 100mm Square - 100x100mm |
| Substrate cross section | Circular - diameter 100mm Square - 100x100mm |
| resist thickness | 5 to 5000µm |
| Gap adjustment between mask and substrate | Combination of aluminium spacers (50µm to 1000µm and kapton film (25µm to 125µm) |
| Mask holder | Magnetic clamp |
| Substrate holder | Magnetic clamp |
| Mask and substrate cooling | Water cooling |
Tilt and Rotation Module
| Tilt angle relative to beam | -2 to 90°(x-axis rotation) 90° is parallel to the beam direction and is the angle at which the mask and substrate chuck assemblies are mounted onto the scanner stage |
| Tilt angle accuray | ≤0.5° |
| Mechanical locking mechanism | Provided for zero degree or normal incident |
| Rotation around the axis of mask and substrate stage | ±180° (z-axis parallel to beam) |
| Rotation angle accuracy | ≤0.5° |
| Repeatability | ≤0.5° |