New Facing Targets Sputtering System
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NFTS Applications
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The performance of low E coating films
Low E coating films prepared by the NFTS equipment comprise of a 5 layered structure of TCO/Ag alloy/TCO/Ag alloy/TCO on 50μm thick PET films. The NFTS equipment is able to simultaneously produce TCO and Ag alloy thin films without strict separation in space among 3 plasma sources in the vacuum chamber. NFTS technology allow to prepare thin films with almost the same composition as its targets materials, then TCO thin films were deposited with too little oxygen gas to be react sputtered Ar atom with oxygen which the Ag alloy plasma source was operated simultaneously. The below figure shows the optical properties of low E coating films with the 5 layers structure produced by the NFTS equipment. And this figure shows similar low E coating films characteristics commercialized 7 layers as well as 5 layers by the conventional MS technology. The figure shows that all the films have the transmittance of around 70% of the same level under the visible light. In contrast, the film produced by NFTS had 10 20% higher reflectance under infrared light compared with commercialized ones. The difference in the reflectance property is considered to be the interface properties among the multilayers produced by each of the sputtering technology.
Optical property of Low-E coating films