New Facing Targets Sputtering System
Overview | Features | Principle | Applications | Product Information
NFTS Applications
NFTS Technology Fields | Low Temperature Crystallization | Mass Production | Performance | TEM Images | Publications
Publications of FTS technology
- M. Naoe and S. Kadokra ,"Preparation of Co Cr Ta films with nano size magnetic domains for 1000 kfci media", MMM 193(1999)185 191.
- S. Kadokura and M. Naoe ,"Perpendicular Co Cr thin films using a new sputtering plasma generating apparatus", MMM 193(1999) 114 116.
- S. Kadokura and M. Naoe , Y. Maeda,"Nano size Magnetic Crystallite Formation in Co Cr Thin Films for Perpendicular Recording Media", IEEE Trans. on Magn.,vol.34,pp.1642 1644(1998).
- S.Kadokura and M. Naoe , "Advanced sputtering techniques for high rate --,plasma free deposition and excellent target utility with uniform erosion", Vacuum/vol.51/No.4/pp.683 686(1998)
- JP Application No. H09 239236, JP Application No. H09 143590, JP Application No. H08 277683, JP Application No. H08 203322, JP Application No. H08 162676, U.S. P.A. S.N.09/088,091
- M. Naoe and S. Kadokura , "Nano Structure in Co Cr Layer by Plusma Free Sputtering and Super fine Co Region", J. Magn . Soc., Jpn , Vol.21, Suppl.S1,pp.1 4(1997)
- S. Kadokura and M. Naoe , "Evaluation of Spinodal Separation Process at Generation of Co Cr Thin Layer Film", J. Magn . Soc., Jpn , Vol.21, Suppl.S1,pp.5 9(1997)
- S. Kadokura and M. Naoe ," Sputtering Conditions for Depositing Co Cr Ta Films with Voidless Morphology and Nano size Domains", IEEE Trans. on Magn.,vol.32,pp.3816 3818(1996)
- M. Hirasaka,S . Kadokura and S. Sobajima ,"Microstructure of Co Cr Film Prepared by Facing Targets Sputtering System", J.Magn.Soc . Jpn . vol.18,Suppl.No.S1,(PMRC'94),pp.19 22(1994)
- M. Naoe and S. Kadokura Voidless Grainboundary Growth Process of Co Cr Thin Films", J.Magn.Soc . Jpn . vol.18,Suppl.No.S1,(PMRC'94),pp.331 334(1994)
- S. Kadokura , M. Naoe and K. Honjo , "New Facing Target Sputtering System having Horizontal Magnetic Field", IEICE, '91/8 V ｏｌ．ｏｌ．, Ｊ７４－Ｃ－ＩＩ、 pp.642 651(1991).
- S. Kadokura and K. Honjo , Plasma confinement technology of Facing Taget Sputtering Systems for Large scale mass production coaters, Advanced Materials '93, II/B: Information Storage Materials, Trans. Mat. Res. Soc., Jpn ., Vol. 15B, 737 742 (1993)